picture of automatic silicon wafer cleaning machine
KZ-Automatic Silicon Wafer Cleaning Machine
Type: KZ-LS-SWC
Overview
After sequences of process, silicon wafers have been contaminated in varying degrees on the surface, which need cleaning .
A Cleaning object: solar cell wafer
B Material: monosilicon/polysilicon wafer
C Producing capacity: 2000pcs/hour
D Takt time: ~7.5min/basket(adjustable for customers)
E Valid dimension of basket: L730*W410*H200(mm)
F Load capacity: 200 wafers/basket
Technique Process(can be customized)
Load
1 Ultrasonic cleaning
2 Ultrasonic cleaning
3 Ultrasonic lye cleaning
4 Ultrasonic lye cleaning
5 Ultrasonic cleaning
6 Ultrasonic cleaning
7 Slow rising, pre-dehydration
8 Tunnel drying
Unload
ⅠHigh EfficiencyⅡHigh Quality ⅢLow price
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Wendy Zhang
Hotline: 86-512-52992666-8010
MSN:wendy.zhang.kzonetech@msn.cn
Type: KZ-LS-SWC
Overview
After sequences of process, silicon wafers have been contaminated in varying degrees on the surface, which need cleaning .
A Cleaning object: solar cell wafer
B Material: monosilicon/polysilicon wafer
C Producing capacity: 2000pcs/hour
D Takt time: ~7.5min/basket(adjustable for customers)
E Valid dimension of basket: L730*W410*H200(mm)
F Load capacity: 200 wafers/basket
Technique Process(can be customized)
Load
1 Ultrasonic cleaning
2 Ultrasonic cleaning
3 Ultrasonic lye cleaning
4 Ultrasonic lye cleaning
5 Ultrasonic cleaning
6 Ultrasonic cleaning
7 Slow rising, pre-dehydration
8 Tunnel drying
Unload
ⅠHigh EfficiencyⅡHigh Quality ⅢLow price
----------------------------------
Wendy Zhang
Hotline: 86-512-52992666-8010
MSN:wendy.zhang.kzonetech@msn.cn
Certificate
- ISO9001
Main Products
Polysilicon Wafer Texture & Washing Machine Silicon Wafer Wet Etching